Company Profile
Corporate Culture
Certifications & Honors
Development Milestones
Social Responsibility
Semiconductor Chip Manufacturing
Advanced Packaging
Specialty Processes
Research & Custom Solutions
Showerhead Thermal Atomic Layer Deposition
Crossflow Thermal Atomic Layer Deposition
Plasma Enhanced Atomic Layer Deposition
Plasma Enhanced Chemical Vapor Deposition
Reduced Pressure Silicon Epitaxy
NMOS: Si Channel / Strained SiGe Source-Drain; PMOS: Strained SiGe Channel / SiGe Source-Drain; Channel Materials:Pure Si (for NMOS);
Strained SiGe (for PMOS); Pure Ge (Emerging Channel)
Atmospheric Pressure Silicon Epitaxy
Silicon Carbide Epitaxy
Thermal ALD
PEALD|Plasma Enhanced Atomic Layer Deposition
EPI | SiGe Epitaxy Systems
PECVD|Plasma Enhanced Chemical Vapor Deposition
SiC EPI|Silicon Carbide Epitaxy
ALE|Selective Etch
Selective Etch
Service Support
Global Service Network
News
Exhibitions
Join PSR
Talent Philosophy
Competitive Compensation
Contact PSR
Customer Portal
Supplier Portal
Release time：2025.02.12
Previous article：
Next article：
