Market Applications：High-k/Metal Gate (HKMG)；Buried Word Line (bWL), Storage Node (SN) Gapfill；Word Line (WL)；CMOS Image Sensors；Deep Trench Capacitor (DTC)；Metal-Insulator-Metal Capacitor (MIM)
Product Catalog
PSR’s self-developed equipment addresses the requirements of advanced process nodes in semiconductor manufacturing, covering critical segments including Logic, DRAM, and 3D NAND.
Showerhead Thermal Atomic Layer Deposition
Market Applications：High-k/Metal Gate (HKMG)；Buried Word Line (bWL), Storage Node (SN) Gapfill；Word Line (WL)；CMOS Image Sensors；Deep Trench Capacitor (DTC)；Metal-Insulator-Metal Capacitor (MIM)
Crossflow Thermal Atomic Layer Deposition
Market Applications：High-k / Dipole Layer Engineering；High-k Dielectric Integration；CMOS Image Sensor Fabrication；Metal-Insulator-Metal (MIM) Capacitors
