Auroalis Plasma-Enhanced Chemical Vapor Deposition(PECVD) System, mounted on the PSR platform Celeritas-8, processes up to 8 wafers simultaneously, meeting the demands for high productivity and high film quality. Auroalis series of products ensures high process stability through optimized flow field, thermal field, and RF circuit designs; ceramic heater provides a solution to the wafer warping issue; and optimization of chamber component materials and surface treatment processes effectively lowers particles. Auroalis provides solutions for a wide range of customers from planar architecture to high aspect ratio 3D structures, for multiple device types and process nodes.
