Auroalis Plasma-Enhanced Chemical Vapor Deposition(PECVD) System,mountedonthePSRtwin-chamberplatform Celeritas-8, processes up to8wafers simultaneously,meeting the demands for high productivity and high film quality.Auroalis series of productsensureshighprocessstabilitythroughoptimized flow field,thermal field,and RF circuit designs; ceramic heater provides a solution to thewaferwarping issue; and optimization of chamber component materials and surface treatment processes effectivelylowers particles.Auroalis provides solutionsfor a widerangeofcustomersfromplanar architecture tohigh aspect ratio3Dstructures,formultiple device types and processnodes.