Spritz tALD is based on a showerhead dual-chamber design, combined with the high-throughput twin-chamber Celeritas-8 transfer module and the intelligent Exsequisoftware platform, which greatly enhances the through-put and stability of the system.Additionally,Spritz tALD is equipped with advanced intake,mixing,and gas distribution systems that greatly improve film uniformity and reduce particle generation.The multi-zone temperature control system effectively reduces particle generation in the showerhead area,while in-situ cleaning extends chamber life and significantly lowers customer operating costs.Spritz tALD can be widely used for HKMG metal layer deposition such as pMetal/nMetal/Metal contacts,NAND WL,DRAM bWL and film deposition for storage node area.
