Spritz Thermal ALD is based on a showerhead dual-chamber design, combined with the high-throughput Celeritas-8 transfer module and the intelligent Exsequisoftware platform, which greatly enhances the through-put and stability of the system. Additionally, Spritz is equipped with advanced intake, mixing, and gas distribution systems that greatly improve film uniformity and reduce particle generation. The multi-zone temperature control system effectively reduces particle generation in the showerhead area, while in-situ cleaning extends chamber life and significantly lowers customer operating costs.
Spritz can be widely used for HKMG metal layer deposition such as pMetal/nMetal/Metal contacts, NAND WL, DRAM bWL and film deposition for storage node area.
