Fluxus is featuring an innovative crossflow dual-chamber design combined with the high-throughput Celeritas-8 transfer module and the intelligent Exsequi software platform, which greatly enhances the through-put and stability of the system. Additionally, Fluxus is equipped with various advanced key components that significantly improve chamber stability, film uniformity, and chamber life time. For instance, the most advanced solid source delivery system ensures the stability of the precursor delivery, and the Wafer Indexing system effectively aids in improving film uniformity.
Fluxus can be widely used for film deposition in Logic FEOL High-k/Dipole and DRAM Peri High-k/Dipole applications.
