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Semiconductor chip Fabrication
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Shower Head tALD Thermal Atomic Layer Deposition
Cross Flow Thermal Atomic Layer Deposition
Plasma Enhanced Atomic Layer Deposition
Plasma Enhanced Chemical Vapor Deposition
Reduced Pressure Silicon Epitaxy
NMOS/PMOS/Channel si/Channel siGe/pure Ge required for high-end chips
Atmospheric Pressure Silicon Epitaxy
Silicon Carbide Epitaxy
Thermal ALD|Thermal Atomic Layer Deposition
PEALD| Plasma Enhanced Atomic Layer Deposition
EPI| Silicon Carbide Epitaxy
PECVD| Plasma Enhanced Chemical Vapor Deposition
SiC EPI| Silicon Carbide Epitaxy
ALE| Selective Etch
Selective Etch
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Release time：2024.10.10
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